Optimizing Calibration Process and Reducing Measurement Uncertainties in Wafer-Level mm-Wave Range Characterization

Wafer-level measurements in the mm-wave frequency range are essential for the precise characterization of high-frequency semiconductor devices and circuits. However, the increasing complexity of mm-wave measurements introduce significant challenges in maintaining calibration accuracy and minimizing measurement errors. This presentation discusses advanced on-wafer RF calibration techniques, specifically targeting error minimization in the mm-wave range. Key areas of focus include the systematic analysis and optimization of calibration standards, probe positioning, and mitigating parasitic effects through refined calibration procedures. Furthermore, we discuss probe-to-pad contact repeatability, and the impact of environmental variations, including temperature, on measurement accuracy.